TOP Brush
Unique formulation and perfect foaming technology brings Top Brush Highly porosity and consistent pore structure result in the superior wafer cleaning performance.
product description
Unique formulation and perfect foaming technology brings Top Brush Highly porosity and consistent pore structure result in the superior wafer cleaning performance.Product Specifications
| Physical PropertiesPhysical | Raw Material | PVA |
|---|---|---|
| Gravity (Dry) | 0.1 – 0.15 | |
| Porosity (%) | 85 - 95 | |
| Pore Diameter (um) | 50μm | |
| Water Retention (%) | 900 – 1100 | |
| Hardness (SL) | 50~70SL | |
| Tensile Force (Dry) | 24 kg/cm2 | |
| Tensile Force (Wet) | 4 kg/cm2 | |
| Heat Resistance | 60°C | |
| Cleanliness SpecCleanliness | F- | <1ppb |
| Cl- | <50ppb | |
| NO3- | <50ppb | |
| PO4-3 | <5ppb | |
| SO4-2 | <20ppb | |
| Na+ | <5ppb | |
| NH4+ | <50ppb | |
| K+ | <1ppb | |
| Li+ | <1ppb | |
| Mg+2 | <1ppb | |
| Ca+2 | <5ppb | |
| Contamination Spec | Silicone Oil | Not Allow |
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